Amorphous Silicon (a-Si:H)/Silicon Nitride (a-SiNx:H) Superlattice by D.C Plasma Enhanced Chemical Vapour Deposition: Preparation and Characterisation

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Published: Jun 30, 2005

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Sufian Mousa Ibrahim Mitani
University Of Malaya

Abstract

Amorphous Silicon (a-Si:H)/Silicon Nitride (a-SiNx:H) Superlattice by D.C Plasma Enhanced Chemical Vapour Deposition: Preparation and Characterisation

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How to Cite
Ibrahim Mitani, S. M. (2005). Amorphous Silicon (a-Si:H)/Silicon Nitride (a-SiNx:H) Superlattice by D.C Plasma Enhanced Chemical Vapour Deposition: Preparation and Characterisation. Malaysian Journal of Science, 24(1), 88. Retrieved from https://mjs.um.edu.my/index.php/MJS/article/view/17173
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Vol. 24 No. 1 (2005): June 2005
Section
Short Communication

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